Towards 2-10 nm electron-beam lithography: a quantitative approach

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	805-809
Number of pages	5
Journal	Microelectronic Engineering
Volume	85
Publication status	Published - 2008

Keywords

@article{57a0bcf0126f4fe1880085359c01eacb,

title = "Towards 2-10 nm electron-beam lithography: a quantitative approach",

keywords = "CWTS JFIS < 0.75",

author = "VA Sidorkin and {van Run}, AJ and {van Langen-Suurling}, AK and AE Grigorescu and {van der Drift}, EWJM",

year = "2008",

language = "Undefined/Unknown",

volume = "85",

pages = "805--809",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}